CHEMICAL VAPOR-DEPOSITION OF SIC LAYERS FROM A GAS-MIXTURE OF CH3SICL3+H2+AR

被引：4
|
作者：
MOTOJIMA, S
HASEGAWA, M
机构：
[1] Department of Applied Chemistry, Faculty of Engineering, Gifu University, Gifu
来源：
THIN SOLID FILMS | 1990年 / 186卷 / 02期
关键词：
D O I：
10.1016/0040-6090(90)90154-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：L39 / L45
页数：7
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