CHEMICAL VAPOR-DEPOSITION OF SIC LAYERS FROM A GAS-MIXTURE OF CH3SICL3+H2+AR

被引：4
|
作者：
MOTOJIMA, S
HASEGAWA, M
机构：
[1] Department of Applied Chemistry, Faculty of Engineering, Gifu University, Gifu
来源：
THIN SOLID FILMS | 1990年 / 186卷 / 02期
关键词：
D O I：
10.1016/0040-6090(90)90154-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：L39 / L45
页数：7
相关论文
共 50 条
  • [1] CHEMICAL VAPOR-DEPOSITION OF SIC LAYERS FROM A GAS-MIXTURE OF CH3SICL3+H2(+AR), AND EFFECTS OF THE LINEAR VELOCITY AND AR ADDITION
    MOTOJIMA, S
    HASEGAWA, M
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (05): : 3763 - 3768
  • [2] Composition of the gas phase during deposition of SiC layers from reactive mixture CH3SiCl3 + Ar + H2
    [J]. J Parallel Distrib Comput, 2 (73):
  • [3] COMPOSITION OF THE GAS-PHASE DURING DEPOSITION OF SIC LAYERS FROM REACTIVE MIXTURE CH3SICL3+AR+H-2
    JONAS, S
    PALUSZKIEWICZ, C
    PTAK, WS
    SADOWSKI, W
    [J]. JOURNAL OF MOLECULAR STRUCTURE, 1995, 349 : 73 - 76
  • [4] CHEMICAL VAPOR-DEPOSITION OF DIAMONDS FROM CH4-H2 GAS-MIXTURE AND THE ORIGIN OF DIAMONDS IN METEORITES
    FUKUNAGA, K
    MATSUDA, J
    ITO, K
    NAGAO, K
    MIYAMOTO, M
    [J]. METEORITICS, 1987, 22 (04): : 381 - 382
  • [5] Growth kinetics of chemical vapor deposition of β-SiC from (CH3)2SiCl2/Ar
    Tago, T
    Kawase, M
    Yoshihara, Y
    Hashimoto, K
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (07) : 2516 - 2522
  • [6] Preparation of SiC Coating from CH3SiCl3-H2 Precursor by Chemical Vapor Deposition
    Sun J.-Q.
    Li J.-T.
    Zhang D.-S.
    Zhao H.-L.
    Wei Q.-B.
    Yang H.-X.
    [J]. Surface Technology, 2023, 52 (02): : 289 - 296and306
  • [7] CHEMICAL PROCESSES IN VAPOR-DEPOSITION OF SILICON .2. DEPOSITION FROM SICL3H AND SICL4
    BAN, VS
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) : 1389 - 1391
  • [8] ON THE CHEMICAL VAPOR-DEPOSITION OF ZIRCONIA FROM ZRCL4-H2-CO2-AR GAS-MIXTURE .2. AN EXPERIMENTAL APPROACH
    MINET, J
    LANGLAIS, F
    NASLAIN, R
    [J]. JOURNAL OF THE LESS-COMMON METALS, 1987, 132 (02): : 273 - 287
  • [9] Structural analysis of chemical vapor deposited β-SiC coatings from CH3SiCl3-H2 gas precursor
    Liu, RJ
    Zhang, CR
    Zhou, XG
    Cao, YB
    [J]. JOURNAL OF CRYSTAL GROWTH, 2004, 270 (1-2) : 124 - 127
  • [10] DEPOSITION OF SILICON-NITRIDE FROM SICL4-NH3-AR VAPOR GAS-MIXTURE UNDER NORMAL PRESSURE
    GREKOV, FF
    ZYKOV, AM
    SAVVIN, GS
    [J]. JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1987, 60 (09): : 1797 - 1801
12345