A RHEED STUDY OF THE INITIAL GROWTH OF AG ON THE SI(001) SURFACE

被引:12
|
作者
NISHIMORI, K
TOKUTAKA, H
TAMON, T
KISHIDA, S
ISHIHARA, N
机构
[1] Department of Electrical and Electronic Engineering, Tottori University, Tottori, 680, Koyama
关键词
D O I
10.1016/0039-6028(91)90259-U
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth of Ag on Si(001) 2 x 1 surfaces was studied by reflection high-energy electron diffraction (RHEED). An oscillation of the specular beam intensity was observed using a nearly single domain surface of Si(001) 2 x 1 as a function of the Ag coverage at the substrate temperature T(s) = RT (room temperature). Streaks, along the [110] direction for the 2 x 1 surface, in the pattern, developed with increasing Ag coverage up to approximately 1 ML (monolayer). The intensity of the specular beam spot increased immediately after the start of Ag deposition, and decreased to a constant value beyond approximately 1 ML. The RHEED pattern revealed that one-dimensional Ag atomic chains wer formed along the dimer rows of the Si surface. For more than approximately 1.5 ML coverage, Ag islands of the (111) orientation grew epitaxially.
引用
收藏
页码:157 / 161
页数:5
相关论文
共 50 条
  • [1] GROWTH STUDY ON SI(001) VICINAL SURFACES USING RHEED
    SAKAMOTO, K
    SAKAMOTO, T
    NAGAO, S
    HASHIGUCHI, G
    KUNIYOSHI, K
    TAKAHASHI, N
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C545 - C545
  • [2] RHEED investigations of surface diffusion on Si(001)
    Nutzel, JF
    Brichzin, P
    Abstreiter, G
    [J]. APPLIED SURFACE SCIENCE, 1996, 102 : 78 - 81
  • [3] Study of initial stage of SiC growth on Si(100) surface by XPS, RHEED and SEM
    Takaoka, T
    Saito, H
    Igari, Y
    Kusunoki, I
    [J]. SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 203 - 206
  • [4] Surface unwetting during growth of Ag on Si(001)
    Glueckstein, JC
    Evans, MMR
    Nogami, J
    [J]. PHYSICAL REVIEW B, 1996, 54 (16): : 11066 - 11069
  • [5] Surface morphology evolutions during the first stages of epitaxial growth of Si on Ge(001):: a RHEED study
    Dentel, D
    Bischoff, JL
    Kubler, L
    Fauré, J
    [J]. JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 542 - 546
  • [6] Oxygen pressure dependence of the initial oxidation on Si(001) surface studied by AES combined with RHEED
    Takakuwa, Y
    Ishida, F
    Kawawa, T
    [J]. MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 110 - 111
  • [7] ANALYSIS OF RHEED INTENSITIES FROM THE SI(001) SURFACE
    ASHBY, JV
    NORTON, N
    MAKSYM, PA
    [J]. SURFACE SCIENCE, 1986, 175 (03) : 604 - 622
  • [8] STUDY OF SUCCESSIVE PHASE-TRANSITIONS OF THE SI(001)-BI SURFACE BY RHEED
    HANADA, T
    KAWAI, M
    [J]. SURFACE SCIENCE, 1991, 242 (1-3) : 137 - 142
  • [9] A RHEED STUDY OF THE DYNAMICS OF GAAS AND ALGAAS GROWTH ON A (001) SURFACE BY MBE
    HOPKINS, J
    LEYS, MR
    BRUBACH, J
    VANDERVLEUTEN, WC
    WOLTER, JH
    [J]. APPLIED SURFACE SCIENCE, 1995, 84 (03) : 299 - 307
  • [10] The initial growth mode of Ni deposited on a Ag(001) surface
    Lee, KS
    Kim, SH
    Min, HG
    Seo, J
    Kim, JS
    [J]. SURFACE SCIENCE, 1997, 377 (1-3) : 918 - 922