MORPHOLOGY OF ANODICALLY ETCHED SI(111) SURFACES - A STRUCTURAL COMPARISON OF NH4F VERSUS HF ETCHING

被引：14
|
作者：
HOUBERTZ, R [1 ]
MEMMERT, U [1 ]
BEHM, RJ [1 ]
机构：
[1] UNIV ULM,OBERFLACHENCHEM & KATALYSE ABT,D-89069 ULM,GERMANY
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587490
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3145 / 3148
页数：4
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