MICROBIAL PROCESSING OF VOLATILE ORGANICS IN INDUSTRIAL-WASTE STREAMS

A strain of Pseudomonas putida has been isolated which tolerates and metabolizes toluene and p-xylene. In our laboratory, this isolate has undergone selection and adaptation and presently is able to grow under a layer of 100% p-xylene. From batch studies the initial rates of degradation are 1-3 mg/min/L. This strain of P. putida also tolerates the presence of a nonionic surfactant while still maintaining its metabolic activity. Preliminary testing using this isolate under chemostat conditions indicates that the potential for developing a bioprocess to treat these waste solvents may be possible.