ATOMIC-HYDROGEN RESIST PROCESS WITH ELECTRON-BEAM LITHOGRAPHY FOR SELECTIVE AL PATTERNING

被引：8
|
作者：
MASU, K
TSUBOUCHI, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587610
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3270 / 3274
页数：5
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