ATOMIC-HYDROGEN RESIST PROCESS WITH ELECTRON-BEAM LITHOGRAPHY FOR SELECTIVE AL PATTERNING

被引：8
|
作者：
MASU, K
TSUBOUCHI, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587610
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3270 / 3274
页数：5
相关论文
共 50 条
  • [1] Resist process windows in electron-beam lithography
    Jamieson, Andrew T.
    Wilcox, Nathan
    Kwok, Wai Y.
    Kim, Yong Kwan
    PHOTOMASK TECHNOLOGY 2010, 2010, 7823
  • [2] Patterning of hyperbranched resist materials by electron-beam lithography.
    Trimble, AR
    Tully, DC
    Fréchet, JMJ
    Medeiros, DR
    Angelopoulos, M
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 219 : U384 - U384
  • [3] RESIST PROCESS TO JOIN ELECTRON-BEAM LITHOGRAPHY AND PHOTOLITHOGRAPHY
    BAUCH, L
    BOTTCHER, M
    JAGDHOLD, U
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 371 - 374
  • [4] AREA-SELECTIVE ALUMINUM PATTERNING USING ATOMIC-HYDROGEN RESIST
    TSUBOUCHI, K
    MASU, K
    SASAKI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1993, 32 (1B): : 278 - 281
  • [5] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
    LIU, W
    INGINO, J
    PEASE, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
  • [6] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
    LAI, JH
    JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
  • [7] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    NAITO, J
    KITAKOHJI, T
    OKUYAMA, H
    MURAKAWA, K
    POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114
  • [8] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    MIYAGAWA, M
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1982, 18 (03): : 453 - 467
  • [9] Resist charging in electron-beam lithography
    Bai, M
    Picard, D
    Tanasa, C
    McCord, MA
    Berglund, CN
    Pease, RFW
    18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 383 - 388
  • [10] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY.
    Yoneda, Yasuhiro
    Kitamura, Kenroh
    Miyagawa, Masashi
    Fujitsu Scientific and Technical Journal, 1982, 18 (03): : 453 - 467
12345