PLASMA POLYMERIZED RESIST AND PLASMA-ETCHING DEVELOPMENT IN A VACUUM LITHOGRAPHY

被引：7
|
作者：
MORITA, S [1 ]
HATTORI, S [1 ]
IEDA, M [1 ]
TAMANO, J [1 ]
YAMADA, M [1 ]
机构：
[1] NAGOYA UNIV,DEPT ELECT ENGN,NAGOYA,AICHI 464,JAPAN
来源：
KOBUNSHI RONBUNSHU | 1981年 / 38卷 / 10期
关键词：
D O I：
10.1295/koron.38.657
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：657 / 664
页数：8
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