SIMULATION OF AN OPTIMIZED ELECTRON-BEAM LITHOGRAPHIC PROCESS

被引：0
|
作者：
CHANG, TS [1 ]
CODELLA, CF [1 ]
LANGE, RC [1 ]
机构：
[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1981年 / 28卷 / 11期
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1428 / 1435
页数：8
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