CHARACTERISTICS OF RF SPUTTERED BARIUM-TITANATE FILMS ON SILICON

被引：25

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作者：

SALAMA, CAT

SICIUNAS, E

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

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D O I：

10.1116/1.1316695

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：91 / &

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