MEASUREMENTS OF LOCAL STRAIN VARIATION IN SI1-XGEX/SI HETEROSTRUCTURES

被引:3
|
作者
BELL, LD
KAISER, WJ
MANION, SJ
MILLIKEN, AM
PIKE, WT
FATHAUER, RW
机构
[1] California Inst of Technology, Pasadena
来源
关键词
D O I
10.1116/1.587864
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The energy splitting of the conduction-band minimum of Si1-xGex due to strain has been directly measured by the application of ballistic-electron-emission microscope (BEEM) spectroscopy to Ag/Si1-xGex structures. Experimental values for this conduction-band splitting agree well with calculations. For Au/Si1-xGex, however, heterogeneity in the strain of the Si1-xGex layer is introduced by deposition of the Au. This variation is attributed to species interdiffusion, which produces a rough Si1-xGex surface. Preliminary modeling indicates that the observed roughness is consistent with the strain variation measured by BEEM. (C) 1995 American Vacuum Society.
引用
收藏
页码:1602 / 1607
页数:6
相关论文
共 50 条
  • [1] STRAIN RELAXATION KINETICS IN SI1-XGEX/SI HETEROSTRUCTURES
    HAUENSTEIN, RJ
    CLEMENS, BM
    MILES, RH
    MARSH, OJ
    CROKE, ET
    MCGILL, TC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04): : 767 - 774
  • [2] STRAIN RELAXATION KINETICS IN SI1-XGEX/SI HETEROSTRUCTURES
    HOUGHTON, DC
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (04) : 2136 - 2151
  • [3] Raman characterization of composition and strain in Si1-xGex/Si heterostructures
    Liu, R
    Tillack, B
    Zaumseil, P
    NONDESTRUCTIVE METHODS FOR MATERIALS CHARACTERIZATION, 2000, 591 : 277 - 282
  • [4] STEBIC of Si/Si1-xGex/Si heterostructures
    Brown, PD
    Humphreys, CJ
    ELECTRON MICROSCOPY AND ANALYSIS 1995, 1995, 147 : 285 - 288
  • [5] Strain relaxation by stripe patterning in Si/Si1-xGex/Si(100) heterostructures
    Uhm, Jangwoong
    Sakuraba, Masao
    Murota, Junichi
    THIN SOLID FILMS, 2006, 508 (1-2) : 239 - 242
  • [6] ADMITTANCE SPECTROSCOPY MEASUREMENTS OF BAND OFFSETS IN SI/SI1-XGEX/SI HETEROSTRUCTURES
    NAUKA, K
    KAMINS, TI
    TURNER, JE
    KING, CA
    HOYT, JL
    GIBBONS, JF
    APPLIED PHYSICS LETTERS, 1992, 60 (02) : 195 - 197
  • [7] Simulation of the process of strain relaxation in Si1-xGex/Si(100) heterostructures
    Fischer, GG
    Zaumseil, P
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 164 (02): : 767 - 778
  • [8] Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures
    Pezzoli, F.
    Bonera, E.
    Grilli, E.
    Guzzi, M.
    Sanguinetti, S.
    Chrastina, D.
    Isella, G.
    von Kaenel, H.
    Wintersberger, E.
    Stangl, J.
    Bauer, G.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2008, 11 (5-6) : 279 - 284
  • [9] Diffusion of phosphorus in relaxed Si1-xGex films and strained Si/Si1-xGex heterostructures
    Christensen, J.S. (jens@imit.kth.se), 1600, American Institute of Physics Inc. (94):
  • [10] Diffusion of phosphorus in relaxed Si1-xGex films and strained Si/Si1-xGex heterostructures
    Christensen, JS
    Radamson, HH
    Kuznetsov, AY
    Svensson, BG
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (10) : 6533 - 6540