CHARACTERIZATION OF REACTIVELY RF-SPUTTERED TANTALUM OXIDE-FILMS

被引：5
|
作者：
TU, YK
LIN, CC
WANG, WS
HUANG, SL
机构：
[1] NATL TAIWAN UNIV,DEPT ELECT ENGN,TAIPEI 10764,TAIWAN
[2] NATL TSING HUA UNIV,DEPT PHYS,HSIN CHU 30043,TAIWAN
来源：
THIN SOLID FILMS | 1988年 / 162卷 / 1-2期
关键词：
D O I：
10.1016/0040-6090(88)90221-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：325 / 331
页数：7
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