PREPARATION AND CHARACTERIZATION OF RF SPUTTERED INDIUM TIN OXIDE-FILMS

被引:135
|
作者
SREENIVAS, K [1 ]
RAO, TS [1 ]
MANSINGH, A [1 ]
CHANDRA, S [1 ]
机构
[1] NATL PHYS LAB, NEW DELHI 110012, INDIA
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D O I
10.1063/1.335481
中图分类号
O59 [应用物理学];
学科分类号
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页码:384 / 392
页数:9
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