ANALYSIS TECHNIQUES OF CHARGING DAMAGE STUDIED ON 3 DIFFERENT HIGH-CURRENT ION IMPLANTERS

被引：11
|
作者：
FELCH, SB
LARSON, LA
CURRENT, MI
LINDSEY, DW
机构：
[1] NATL SEMICOND CORP,SANTA CLARA,CA 95052
[2] EATON NOVA,SUNNYVALE,CA 94086
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷
关键词：
D O I：
10.1016/0168-583X(89)90247-4
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：563 / 567
页数：5
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