FORMATION OF HIGH-TC SUPERCONDUCTING FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION

被引：177
|
作者：
BERRY, AD
GASKILL, DK
HOLM, RT
CUKAUSKAS, EJ
KAPLAN, R
HENRY, RL
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 20期
关键词：
D O I：
10.1063/1.99719
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1743 / 1745
页数：3
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