CONDUCTION PROCESSES IN VACUUM-DEPOSITED FILMS OF SILICON OXIDE

被引：12

|

作者：

MORLEY, AR

CAMPBELL, DS

ANDERSON, JC

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1969年 / 4卷 / 03期

关键词：

D O I：

10.1007/BF00549926

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：259 / &

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