CONCENTRATION-DEPENDENT DIFFUSION OF BORON AND PHOSPHORUS IN SILICON

被引：37

作者：

THAI, ND

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 07期

关键词：

D O I：

10.1063/1.1659328

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2859 / &

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[31] CONCENTRATION-DEPENDENT DIFFUSION APPLIED TO GROUNDWATER CONTAMINATION PROBLEMS
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[J]. JOURNAL OF HYDROLOGY, 1978, 37 (3-4) : 333 - 337
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