CONCENTRATION-DEPENDENT DIFFUSION OF BORON AND PHOSPHORUS IN SILICON

被引：37

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作者：

THAI, ND

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 07期

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D O I：

10.1063/1.1659328

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2859 / &

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