AN EBIS FOR USE WITH SYNCHROTRON-RADIATION

被引：5
|
作者：
KRAVIS, S
OURA, M
AWAYA, Y
OKUNO, K
KIMURA, M
机构：
[1] TOKYO METROPOLITAN UNIV,HACHIOJI,TOKYO 19203,JAPAN
[2] OSAKA UNIV,TOYONAKA,OSAKA 560,JAPAN
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1994年 / 65卷 / 04期
关键词：
D O I：
10.1063/1.1145064
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
At RIKEN we have constructed an electron-beam ion source (EBIS) for use with synchrotron radiation to study the photoionization process of highly charged ions. The reason for using an EBIS as an ion target is that it can produce several orders of magnitude higher density ion targets than conventional ion sources in an ultra-high-vacuum environment. Calculations have shown that ion densities between 10(8) and 10(10) ions/cm3, under various operating conditions, are obtainable in an EBIT. The apparatus will also be used to test the photon beam ion source (PHOBIS) mode of operation to create low-energy multicharged ions by replacing the electron beam with synchrotron radiation.
引用
收藏
页码：1066 / 1068
页数：3
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