EFFECT OF THE CONCENTRATION OF NITROGEN ON THE MICROSTRUCTURE AND DARK CONDUCTIVITY OF A-SI1-XNX-H FILMS

被引：0
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作者：
BUDAGYAN, BG
AIVAZOV, AA
SAZONOV, AY
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来源：
SEMICONDUCTORS | 1993年 / 27卷 / 08期
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中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：754 / 756
页数：3
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