A NEW HEAT-TREATMENT TECHNIQUE FOR NO THERMAL-CONVERSION OF SEMI-INSULATING GAAS WAFERS

被引：0
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作者：
TANAKA, T
TAKAMIYA, S
ISHII, M
SUSAKI, W
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷
关键词：
D O I：
10.7567/JJAPS.19S1.473
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：473 / 477
页数：5
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