Electrical and structural properties of flash evaporation InSb thin films

被引:0
|
作者
Al-Ani, S. K. J. [1 ]
Obaid, Y. N. [1 ]
Kasim, S. J. [2 ]
Mahdi, M. A. [2 ]
机构
[1] Al Mustanseriya Univ, Phys Dept, Coll Sci, Baghdad, Iraq
[2] Basrah Univ, Phys Dept, Coll Sci, Basrah, Iraq
来源
INTERNATIONAL JOURNAL OF NANOELECTRONICS AND MATERIALS | 2009年 / 2卷 / 01期
关键词
InSb thin films; Flash evaporation; X-ray diffraction; Hall Effect; Electrical conductivity;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Indium antimonide (InSb) thin films were prepared on glass substrates by flash evaporation technique of a stoichiometric bulk of InSb at different substrate temperatures Ts= (300,320,350) degrees C. Films thickness were in the range of t= (0.2-0.6) mu m. X-ray diffraction patterns of InSb powder and thin films were given. The patterns showed that all films were stoichiometric and the crystallinity degree was improved with increasing of the substrate temperature and film thickness. The Hall effect measurements at room temperature showed that all films have n-type conductivity except the film of 0.2 mu m thickness prepared at Ts=350 degrees C was p-type conductivity. The electrical conductivity was studied in temperature range (25-200) degrees C and it was decreased with increased the substrate temperature for all samples. The carrier's mobility at room temperature was found to be increased with film thickness and substrate temperature.
引用
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页码:99 / +
页数:11
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