Pulsed-laser deposition of selenium

被引：9

作者：

FernandezGuasti, M ^{[1
]}

HaroPoniatowski, E ^{[1
]}

Diamant, R ^{[1
]}

Ponce, L ^{[1
]}

Jimenez, E ^{[1
]}

机构：

[1] UNIV LA HABANA,IMRE,HAVANA,CUBA

来源：

JOURNAL OF MATERIALS SCIENCE | 1995年 / 30卷 / 24期

关键词：

D O I：

10.1007/BF00369674

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar to that obtained by a thermal process. A study of the emission spectra of the plasma generated during ablation is included.

引用

页码：6253 / 6256

页数：4

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