INTERFACIAL RESISTANCE IN EXOTHERMIC GAS-ABSORPTION WITH CHEMICAL-REACTION

被引：7
|
作者：
CHANG, CY
HWANG, DC
机构：
[1] Natl Taiwan Univ, Taipei, Taiwan, Natl Taiwan Univ, Taipei, Taiwan
来源：
CHEMICAL ENGINEERING JOURNAL AND THE BIOCHEMICAL ENGINEERING JOURNAL | 1988年 / 38卷 / 03期
关键词：
AIR POLLUTION - Control - CHEMICAL REACTIONS - Reaction Kinetics - GAS PURIFICATION - Scrubbers;
D O I：
10.1016/0300-9467(88)80077-7
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
A film-theory model for exothermic gas absorption with chemical reaction, taking into consideration the effect of surface resistance, is presented. A closed-form solution has been obtained. The results indicate that the surface resistance significantly affects the absorption rate, the interfacial temperature rise, and the solubility. A faster chemical reaction increases the extent of these variations. The effect of the enhancement factor is quite complex not only on the interaction of the solubility reduction and the reaction rate enlargement, but also on the absorption rate reduction caused by the existence of interfacial resistance.
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页码：187 / 193
页数：7
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