LINEWIDTH CONTROL IN PROJECTION LITHOGRAPHY USING A MULTILAYER RESIST PROCESS

被引：26
|
作者：
OTOOLE, MM
LIU, ED
CHANG, MS
机构：
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1981年 / 28卷 / 11期
关键词：
D O I：
10.1109/T-ED.1981.20622
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：1405 / 1410
页数：6
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