DEVELOPMENT OF A SYSTEM FOR INSITU OBSERVATION OF DAMAGE BY DUAL ION-BEAM IRRADIATION IN A 400 KV ELECTRON-MICROSCOPE

被引：0
|
作者：
FURUNO, S
HOJOU, K
OTSU, H
IZUI, K
SASAKI, TA
TSUKAMOTO, T
HATA, T
机构：
[1] JAPAN ATOM ENERGY RES INST,DEPT CHEM,TOKAI,IBARAKI 31911,JAPAN
[2] ORIJIN ELECT CO LTD,TOSHIMA KU,TOKYO 171,JAPAN
[3] JEOL LTD,TOKYO 196,JAPAN
来源：
JOURNAL OF ELECTRON MICROSCOPY | 1990年 / 39卷 / 04期
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中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
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页码：320 / 320
页数：1
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