MICROENCAPSULATION BY VAPOR-DEPOSITION

被引：0

|

作者：

JAYNE, WM ^{[1
]}

机构：

[1] UNION CARBIDE CORP,RIVER RD,BOUND BROOK,NJ 08805

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1973年 / AUG26期

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：74 / 74

页数：1

相关论文

共 50 条

[41] DIAMOND CHEMICAL VAPOR-DEPOSITION
BACHMANN, PK
LEERS, D
WIECHERT, DU
JOURNAL DE PHYSIQUE IV, 1991, 1 (C2): : 907 - 913
[42] METALORGANIC CHEMICAL VAPOR-DEPOSITION
MILLER, LM
COLEMAN, JJ
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1988, 15 (01): : 1 - 26
[43] PHOTOCHEMICAL VAPOR-DEPOSITION OF TITANIUMDIBORIDE
ELDERS, J
BEBELAAR, D
VANVOORST, JDW
APPLIED SURFACE SCIENCE, 1990, 46 (1-4) : 215 - 219
[44] INTRODUCTION TO CHEMICAL VAPOR-DEPOSITION
HAMMOND, ML
SOLID STATE TECHNOLOGY, 1979, 22 (12) : 61 - 65
[45] LASER CHEMICAL VAPOR-DEPOSITION
ROY, SK
BULLETIN OF MATERIALS SCIENCE, 1988, 11 (2-3) : 129 - 135
[46] MATERIALS AND PROCESSES FOR PREFORM FABRICATION - MODIFIED CHEMICAL VAPOR-DEPOSITION AND PLASMA CHEMICAL VAPOR-DEPOSITION
MACCHESNEY, JB
PROCEEDINGS OF THE IEEE, 1980, 68 (10) : 1181 - 1184
[47] CHEMICAL VAPOR-DEPOSITION OF TANTALUM DISILICIDE
WIECZOREK, C
THIN SOLID FILMS, 1985, 126 (3-4) : 227 - 232
[48] APPLICATIONS FOR LASER CHEMICAL VAPOR-DEPOSITION
ALLEN, SD
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (10) : 1461 - 1461
[49] PRECURSOR DESIGN FOR CHEMICAL VAPOR-DEPOSITION
CARLSSON, JO
ACTA CHEMICA SCANDINAVICA, 1991, 45 (08): : 864 - 869
[50] KINETIC SIMULATION OF VAPOR-DEPOSITION AND GROWTH
ROONEY, PW
HELLMAN, F
PHYSICAL REVIEW B, 1993, 48 (05): : 3079 - 3084

← 1 2 3 4 5 →