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- [1] Performance of a phase-shift focus monitor reticle designed for 193-nm use OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 108 - 115
- [2] Characterization of autofocus uniformity and precision on ASML steppers using the phase shift focus monitor reticle OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 448 - 455
- [3] RETICLE CONTAMINATION MONITOR FOR A WAFER STEPPER PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 470 : 242 - 249
- [5] Design considerations for a photo track monitor reticle METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 330 - 336
- [6] SETTING OPTIMUM FOCUS OF PINHOLE OR RETICLE OF A COLLIMATOR LENS APPLIED OPTICS, 1976, 15 (05): : 1104 - 1104
- [7] Buy and sell to focus the automation division CONTROL AND INSTRUMENTATION, 1999, 31 (09): : 6 - 6
- [9] Development of a new defect sensitivity monitor for advanced OPC reticle technology 15TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS '98, 1999, 3665 : 47 - 54
- [10] Desirable reticle flatness from focus deviation standpoint in optical lithography OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 530 - 540