STUDIES ON THE PROPERTIES OF ZIRCONIA FILMS PREPARED BY DIRECT-CURRENT REACTIVE MAGNETRON SPUTTERING

被引：23
|
作者：
SUHAIL, MH
RAO, GM
MOHAN, S
机构：
[1] Instrumentation and services Unit, Indian Institute of Science
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 05期
关键词：
D O I：
10.1116/1.577223
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This paper deals with the preparation of zirconia films by direct current reactive magnetron sputtering. The films were annealed in ambient atmosphere at temperatures ranging from 300 to 850-degrees-C. The as deposited films were found to be amorphous and a crystalline structure developed at 400-degrees-C. The refractive index and extinction coefficient were found to be 1.93 and 0.5 x 10(-3) at 600 nm for the as deposited films and they changed to 1.71 and 2.5 x 10(-3) on annealing at 850-degrees-C. The optical constants were found to be constant in the wavelength region beyond 400 nm, below which dispersion was observed.
引用
收藏
页码：2675 / 2677
页数：3
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