X-RAY MASKS

被引：0
|
作者：
ODA, M
OHKI, S
KAKUCHI, M
YOSHIHARA, H
机构：
来源：
NTT REVIEW | 1990年 / 2卷 / 04期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
下载
收藏
页码：101 / 107
页数：7
相关论文
共 50 条
  • [1] X-ray masks
    Ohki, Shigehisa
    Ozawa, Akira
    Ohkubo, Takashi
    Okada, Ikuo
    NTT R and D, 1994, 43 (06): : 617 - 624
  • [2] X-RAY MASKS
    OHKI, S
    OZAWA, A
    OHKUBO, T
    OKADA, I
    SEKIMOTO, M
    SAITOH, Y
    MATSUDA, T
    NTT REVIEW, 1995, 7 (04): : 40 - 45
  • [3] X-ray masks
    Oda, M
    Uchiyama, S
    Okada, I
    Ohkubo, T
    NTT REVIEW, 1998, 10 (06): : 60 - 64
  • [4] X-ray masks
    NTT Rev, 4 (40-45):
  • [5] Reflective x-ray masks for x-ray lithography
    Chumak, V. S.
    Peredkov, S.
    Devizenko, A. Yu
    Kopylets, I. A.
    Pershyn, Yu P.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2024, 34 (04)
  • [6] X-Ray masks for very deep X-Ray lithography
    J. Klein
    H. Guckel
    D. P. Siddons
    E. D. Johnson
    Microsystem Technologies, 1998, 4 : 70 - 73
  • [7] X-Ray masks for very deep X-Ray lithography
    Klein, J
    Guckel, H
    Siddons, DP
    Johnson, ED
    MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 70 - 73
  • [8] A cleaning process for X-ray masks
    Saitoh, Y
    Ohkubo, T
    Okada, I
    Sekimoto, M
    Matsuda, T
    PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 198 - 203
  • [9] DIAMOND MEMBRANES FOR X-RAY MASKS
    LOCHEL, B
    SCHLIWINSKI, HJ
    HUBER, HL
    TRUBE, J
    SCHAFER, L
    KLAGES, CP
    LUTHJE, H
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 175 - 179
  • [10] Pellicles for X-ray lithography masks
    Maldonado, JR
    Cordes, S
    Leavey, J
    Acosta, R
    Doany, F
    Angelopoulus, M
    Waskiewicz, C
    EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 245 - 254
12345