Ideally weak nitriding kinetics during gaseous nitriding of Fe-2at.% Si alloy

被引:0
|
作者
Meka, S. [1 ]
Schacherl, R. [2 ]
Bischoff, E. [1 ]
Mittemeijer, E. J. [1 ,2 ]
机构
[1] Max Planck Inst Met Res, Stuttgart, Germany
[2] Univ Stuttgart, Inst Mat Sci, Stuttgart, Germany
来源
关键词
Gas nitriding; Fe-Si alloy; weak-nitriding kinetics; amorphous siliconnitride;
D O I
暂无
中图分类号
O414.1 [热力学];
学科分类号
摘要
Fe-2.03at.% Si alloy was internally nitrided, employing NH3/H-2 gas mixtures at 580 degrees C using a nitriding potential (rN) of 0.104 atm(-1/2). The nitrided specimens were primarily characterized by light microscopy, scanning electron microscopy and hardness measurements. Surprisingly, and for the first time, an ideally weak nitriding interaction, which is usually observed, for alloying element nitrides which are difficult to precipitate, upon nitriding only thin (about 0.1-0.3 mm thick) Fe-Me alloy specimens, was observed here upon nitriding thick (1 mm) recrystallised Fe-2.03at.% Si alloy specimens. This phenomenon can be attributed to a very large incubation time and very slow kinetics for the precipitation of (amorphous) silicon nitride. Further, an unusual hardness change with increasing nitriding time and a nitrogen-uptake rate increasing with nitriding time were observed. The hardness of the nitrided specimen first increased with increasing nitriding time up to 30 h and then decreased until 165 h and thereafter increased again. The occurrence of the first peak in the hardness versus nitriding time profile (at about 30 h) was ascribed to the development of a metastable, precursory form of silicon nitride.
引用
收藏
页码:102 / 107
页数:6
相关论文
共 50 条
  • [31] Kinetics of layer growth during plasma nitriding of nickel based alloy Inconel 600
    Sun, Y.
    1600, Elsevier Ltd (351): : 1 - 2
  • [32] Optimization of Nitriding Regimes for Sm2Fe17 Alloy Powder
    Kutepov, A. V.
    Tarasov, V. P.
    Ignatov, A. S.
    METALLURGIST, 2017, 60 (11-12) : 1262 - 1266
  • [33] Optimization of Nitriding Regimes for Sm2Fe17 Alloy Powder
    A. V. Kutepov
    V. P. Tarasov
    A. S. Ignatov
    Metallurgist, 2017, 60 : 1262 - 1266
  • [34] AlN growth kinetics during ion nitriding of aluminum
    Fitz, T
    Möller, W
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (11) : 6862 - 6867
  • [35] Growth kinetics of nitride layers during postdischarge nitriding
    Campos, I
    Oseguera, J
    Figueroa, U
    Melendez, E
    SURFACE & COATINGS TECHNOLOGY, 1998, 102 (1-2): : 127 - 131
  • [36] Growth kinetics of nitride layers during postdischarge nitriding
    Campos, I.
    Oseguera, J.
    Figueroa, U.
    Melendez, E.
    Surface and Coatings Technology, 1998, 102 (1-2): : 127 - 131
  • [37] DIFFUSION MECHANISMS AND KINETICS DURING PLASMA NITRIDING OF ALLOYS
    Galdikas, A.
    Moskalioviene, T.
    Petraitiene, A.
    5TH INTERNATIONAL CONFERENCE RADIATION INTERACTION WITH MATERIALS: FUNDAMENTALS AND APPLICATIONS 2014, 2014, : 46 - 46
  • [38] The formation of AlN crystals in an Fe-Mn-Al-C alloy during the nitriding process
    Jaw, JH
    Cheng, WC
    Wang, CJ
    METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE, 2005, 36A (09): : 2289 - 2296
  • [39] The formation of AIN crystals in an Fe-Mn-Al-C alloy during the nitriding process
    Jyh-Hong Jaw
    Wei-Chun Cheng
    Chaur-Jeng Wang
    Metallurgical and Materials Transactions A, 2005, 36 : 2289 - 2296
  • [40] Diffusion kinetics of nitrogen in tantalum during plasma-nitriding
    张德元
    林勤
    曾卫军
    李放
    许兰萍
    付青峰
    TransactionsofNonferrousMetalsSocietyofChina, 2001, (02) : 281 - 282