RF SPUTTER ETCHING - A UNIVERSAL ETCH

被引：0
|
作者：
DAVIDSE, PD
机构：
来源：
VACUUM | 1967年 / 17卷 / 03期
关键词：
D O I：
10.1016/0042-207X(67)93164-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：165 / &
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