PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION

被引：88
|
作者：
AISENBERG, S [1 ]
CHABOT, RW [1 ]
机构：
[1] WHITTAKER CORP, SPACE SCI DIV, WALTHAM, MA 02154 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期
关键词：
D O I：
10.1116/1.1317915
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：104 / 107
页数：4
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