CHARACTERIZATION OF MO/B4C MULTILAYERS

被引：30
|
作者：
JANKOWSKI, AF
PERRY, PL
机构：
[1] Lawrence Livermore National Laboratory, Chemistry and Materials Science, Livermore
来源：
THIN SOLID FILMS | 1991年 / 206卷 / 1-2期
基金：
美国能源部;
关键词：
D O I：
10.1016/0040-6090(91)90452-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The Mo/B4C multilayer system is selected for maximum, normal incidence reflection of 6.7 nm X-rays. Application in projection lithography requires structural optimization for smooth layering and minimal interface roughness. A transmission electron microscopy analysis of samples prepared in cross-section reveals an intrinsic layer roughness despite attempts to refine sputter deposition parameters. The limitations in growth morphology are attributable to interfacial reactivity from inherent phase instability.
引用
收藏
页码：365 / 368
页数：4
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