A SELF-ALIGNED CONTACT MOS PROCESS FOR FABRICATING VLSI CIRCUITS

被引：1
|
作者：
KHAN, MK
GODEJAHN, GC
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 06期
关键词：
D O I：
10.1149/1.2127630
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1333 / 1335
页数：3
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