SURFACE PASSIVATION BY ADDING FLUOROCARBONS AND CHLOROFLUOROCARBONS INTO AN AL DRY ETCH REACTOR

被引：8
|
作者：
MAA, JS
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 03期
关键词：
D O I：
10.1116/1.583800
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：652 / 656
页数：5
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