MEASUREMENT OF ANISOTROPIC STRESS IN OPTICAL THIN-FILM COATINGS

被引：0
|
作者：
LICHTENSTEIN, TL
EASTMAN, JM
机构：
[1] UNIV ROCHESTER,INST OPT,ROCHESTER,NY 14627
[2] UNIV ROCHESTER,LASER ENERGET LAB,ROCHESTER,NY 14627
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1980年 / 70卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
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页码：1050 / 1050
页数：1
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