A NEW 2-LEVEL RESIST PATTERNING PROCESS BASED ON RESIST VOLATILIZATION UNDER DEEP UV EXPOSURE

被引：0
|
作者：
MAKIMURA, T
KATO, N
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 07期
关键词：
D O I：
10.1149/1.2096127
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：1772 / 1773
页数：2
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