MICROWAVE PHOTORESISTIVITY OF A TWO-DIMENSIONAL ELECTRON-GAS AND THE FRACTIONAL QUANTUM HALL-EFFECT

被引：7
|
作者：
GULDNER, Y [1 ]
VOOS, M [1 ]
VIEREN, JP [1 ]
HIRTZ, JP [1 ]
HEIBLUM, M [1 ]
机构：
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
来源：
PHYSICAL REVIEW B | 1987年 / 36卷 / 02期
关键词：
D O I：
10.1103/PhysRevB.36.1266
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1266 / 1268
页数：3
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