MICROWAVE PHOTORESISTIVITY OF A TWO-DIMENSIONAL ELECTRON-GAS AND THE FRACTIONAL QUANTUM HALL-EFFECT

被引:7
|
作者
GULDNER, Y [1 ]
VOOS, M [1 ]
VIEREN, JP [1 ]
HIRTZ, JP [1 ]
HEIBLUM, M [1 ]
机构
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
关键词
D O I
10.1103/PhysRevB.36.1266
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1266 / 1268
页数:3
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