INTERFEROMETRIC EVALUATION OF THICKNESSES OF THIN FILMS

被引：8
|
作者：
TOLANSKY, S
机构：
来源：
JOURNAL DE PHYSIQUE ET LE RADIUM | 1950年 / 11卷 / 07期
关键词：
D O I：
10.1051/jphysrad:01950001107037300
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：373 / 374
页数：2
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