INTERFEROMETRIC EVALUATION OF THICKNESSES OF THIN FILMS

被引：8

|

作者：

TOLANSKY, S

机构：

来源：

JOURNAL DE PHYSIQUE ET LE RADIUM | 1950年 / 11卷 / 07期

关键词：

D O I：

10.1051/jphysrad:01950001107037300

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

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页码：373 / 374

页数：2

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