NON-DESTRUCTIVE CHARACTERIZATION OF GA1-XALXAS-GAAS INTERFACES USING NUCLEAR PROFILING

被引：6
|
作者：
ROSNER, JS [1 ]
LESSER, PMS [1 ]
POLLAK, FH [1 ]
WOODALL, JM [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期
关键词：
D O I：
10.1116/1.571133
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：584 / 588
页数：5
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