SYNCHROTRON-RADIATION SOURCES AND CONDENSERS FOR PROJECTION X-RAY-LITHOGRAPHY

被引：27
|
作者：
MURPHY, JB
WHITE, DL
MACDOWELL, AA
WOOD, OR
机构：
[1] BROOKHAVEN NATL LAB, NATL SYNCHROTRON LIGHT SOURCE, UPTON, NY 11973 USA
[2] AT&T BELL LABS, MURRAY HILL, NJ 07974 USA
来源：
APPLIED OPTICS | 1993年 / 32卷 / 34期
关键词：
D O I：
10.1364/AO.32.006920
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-angstrom photons for production line projection x-ray lithography is possible.
引用
收藏
页码：6920 / 6929
页数：10
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