A CHROMATIC ABERRATION-FREE HETERODYNE ALIGNMENT FOR OPTICAL LITHOGRAPHY

被引：2

作者：

HIGASHIKI, T ^{[1
]}

TOJO, T ^{[1
]}

TABATA, M ^{[1
]}

NISHIZAKA, T ^{[1
]}

MATSUMOTO, M ^{[1
]}

SAMEDA, Y ^{[1
]}

机构：

[1] TOSHIBA CO LTD,HEAVY APPARATUS ENGN LAB,FUCHU 183,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 11期

关键词：

ALIGNMENT; THROUGH-THE-LENS; LITHOGRAPHY; CHROMATIC ABERRATION;

D O I：

10.1143/JJAP.29.2568

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This paper describes the principle of a new alignment method (SMART) and alignment optics using an opticalheterodyne technique. This SMART dose not need to correct chromatic aberration. Therefore, it dose not require any mechanism, such as mirrors, a prism or a lens system to correct chromatic aberration for the projection lens. A pair of one-dimensional gratings for the mask mark and a checker grating for the wafer mark were used in SMART optics. The relation displacement between the mask and the wafer can be directly detected by measuring the phase difference of the heterodyne beat signals. The experimental result for the phase difference was similar to the calculation result. An alignment signal variation of less than 10 nm was obtained.

引用

页码：2568 / 2571

页数：4

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