A STUDY ON THE FIELD DISTRIBUTION OF THIN-FILM HEADS

被引：5
|
作者：
TAKANO, H [1 ]
SHINADA, H [1 ]
SEITOU, S [1 ]
FUKUHARA, S [1 ]
OHNISHI, T [1 ]
OTOMO, S [1 ]
TODOKORO, H [1 ]
SHIIKI, K [1 ]
机构：
[1] HITACHI LTD, CENT RES LAB, KOKUBUNJI, TOKYO 185, JAPAN
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1992年 / 28卷 / 02期
关键词：
D O I：
10.1109/20.123855
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The field distribution of a thin-film inductive head and its relationship to pole configurations are examined. Three components of the field distribution at high frequencies are measured using a newly developed electron beam tomography method. Focused ion beam etching is used for the processing of the pole configuration. A comparison between the measured field distribution and the results of the three-dimensional computer simulation shows that the sharp field distribution suitable for high-density recording is produced to promote magnetization at the tip region. Furthermore, the optimum design of the pole configuration clarifies the feasibility of 1-mu-m track recording.
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页码：1024 / 1030
页数：7
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