COPPER-BASED METALLIZATION AND INTERCONNECTS FOR ULTRA-LARGE-SCALE INTEGRATION APPLICATIONS

被引:18
|
作者
ALFORD, TL
LI, J
MAYER, JW
WANG, SQ
机构
关键词
D O I
10.1016/0040-6090(95)06624-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:R7 / R8
页数:2
相关论文
共 50 条
  • [1] Annealing textures of copper damascene interconnects for ultra-large-scale integration
    Hyo Jong Lee
    Heung Nam Han
    Dong Nyung Lee
    [J]. Journal of Electronic Materials, 2005, 34 : 1493 - 1499
  • [2] Annealing textures of copper damascene interconnects for ultra-large-scale integration
    Lee, HJ
    Han, HN
    Lee, DN
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 2005, 34 (12) : 1493 - 1499
  • [3] A comprehensive comparative study of the performance of carbon- and copper-based interconnects in ultra-large-scale integrated circuits
    Sanaeepur, Majid
    Mahmoudi, Ali
    [J]. INTERNATIONAL JOURNAL OF CIRCUIT THEORY AND APPLICATIONS, 2021, 49 (10) : 3394 - 3407
  • [4] H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration
    Shiratani, Masaharu
    Jin, Hong Jie
    Takenaka, Kosuke
    Koga, Kazunori
    Kinoshita, Toshio
    Watanabe, Yukio
    [J]. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2001, 2 (3-4)
  • [5] COPPER-BASED METALLIZATION FOR ULSI APPLICATIONS
    LI, J
    BLEWER, R
    MAYER, JW
    [J]. MRS BULLETIN, 1993, 18 (06) : 18 - 21
  • [6] Nanoelectromechanical DRAM for ultra-large-scale integration (ULSI)
    Jang, JE
    Cha, SN
    Choi, Y
    Butler, TP
    Kang, DJ
    Hasko, DG
    Jung, JE
    Kim, JM
    Amaratunga, GAJ
    [J]. IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2005, TECHNICAL DIGEST, 2005, : 269 - 272
  • [7] ULTRA-LARGE-SCALE INTEGRATION DEVICE SCALING AND RELIABILITY
    HU, CM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3237 - 3241
  • [8] SELECTIVE AND BLANKET COPPER CHEMICAL-VAPOR-DEPOSITION FOR ULTRA-LARGE-SCALE INTEGRATION
    JAIN, A
    KODAS, TT
    JAIRATH, R
    HAMPDENSMITH, MJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2107 - 2113
  • [9] Copper electroless deposition technology for ultra-large-scale-integration (ULSI) metallization
    ShachamDiamand, Y
    Dubin, VM
    [J]. MICROELECTRONIC ENGINEERING, 1997, 33 (1-4) : 47 - 58
  • [10] Power Delivery for Ultra-Large-Scale Applications on Si-IF
    Safari, Yousef
    Kroon, Anja
    Vaisband, Boris
    [J]. 2022 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS (ISCAS 22), 2022, : 1605 - 1609