REDUCTION OF ND1.85CE0.15CUO4

被引：13

作者：

KOHIKI, S ^{[1
]}

KAWAI, J ^{[1
]}

KAMADA, T ^{[1
]}

HAYASHI, S ^{[1
]}

ADACHI, H ^{[1
]}

SETSUNE, K ^{[1
]}

WASA, K ^{[1
]}

机构：

[1] MATSUSHITA ELECT IND CO LTD,CENT RES LABS,MORIGUCHI,OSAKA 570,JAPAN

来源：

SOLID STATE COMMUNICATIONS | 1990年 / 73卷 / 11期

关键词：

D O I：

10.1016/0038-1098(90)90171-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

X-ray photoemission from the crystalline Nd1.85Ce0.15CuO4 thin films before and after a reduction process suggests that the reduction added electrons to the Cu 4s-O 2p σ bond and enhanced the Cu-O bond covalency. The result of X-ray photoemission supports the changes of electron transport property such a decrease of the resistivity in normal state and a variation of the temperature dependence of the resistivity from semiconductor like to metallic with the reduction. © 1990.

引用

页码：787 / 789

页数：3

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