REDUCTION OF ND1.85CE0.15CUO4

被引：13
|
作者：
KOHIKI, S [1 ]
KAWAI, J [1 ]
KAMADA, T [1 ]
HAYASHI, S [1 ]
ADACHI, H [1 ]
SETSUNE, K [1 ]
WASA, K [1 ]
机构：
[1] MATSUSHITA ELECT IND CO LTD,CENT RES LABS,MORIGUCHI,OSAKA 570,JAPAN
来源：
SOLID STATE COMMUNICATIONS | 1990年 / 73卷 / 11期
关键词：
D O I：
10.1016/0038-1098(90)90171-7
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
X-ray photoemission from the crystalline Nd1.85Ce0.15CuO4 thin films before and after a reduction process suggests that the reduction added electrons to the Cu 4s-O 2p σ bond and enhanced the Cu-O bond covalency. The result of X-ray photoemission supports the changes of electron transport property such a decrease of the resistivity in normal state and a variation of the temperature dependence of the resistivity from semiconductor like to metallic with the reduction. © 1990.
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页码：787 / 789
页数：3
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