Revision of different optical metrology techniques

This work starts from a european project with the goal of improving the quality of the measurement of the planar surfaces, like for instance wafers, liquid crystal screens, etc. For that purpose we selected one of the actual metrology techniques: optical deflectometry. There exist different techniques devoted to the measurement of the shape of surfaces, like for instance light in flight, confocal microscopy, atomic force microscopy, interferometry. By means of these techniques it is possible to calibrate possible irregularities in the sample surface, with respect to a standard surface. Each one of these techniques presents different characteristics in terms of resolution, dynamic range, sensitivity or dimensions of the sample. In this work we present a revision of these techniques and their characteristics.